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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">blackmet</journal-id><journal-title-group><journal-title xml:lang="ru">Известия высших учебных заведений. Черная Металлургия</journal-title><trans-title-group xml:lang="en"><trans-title>Izvestiya. Ferrous Metallurgy</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">0368-0797</issn><issn pub-type="epub">2410-2091</issn><publisher><publisher-name>National University of Science and Technology "MISIS"</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.17073/0368-0797-2015-10-775-780</article-id><article-id custom-type="elpub" pub-id-type="custom">blackmet-747</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>МАТЕРИАЛОВЕДЕНИЕ И НАНОТЕХНОЛОГИИ</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>MATERIAL SCIENCE AND NANOTECHNOLOGIES</subject></subj-group></article-categories><title-group><article-title>ФОРМИРОВАНИЕ ПОВЕРХНОСТНЫХ СПЛАВОВ ПРИ ПЛАВЛЕНИИ СИСТЕМЫ ПЛЕНКА – ПОДЛОЖКА ВЫСОКОИНТЕНСИВНЫМ ИМПУЛЬСНЫМ ЭЛЕКТРОННЫМ ПУЧКОМ. СООБЩЕНИЕ 2</article-title><trans-title-group xml:lang="en"><trans-title>FORMATION OF SURFACE ALLOYS AT MELTING OF FILM-SUBSTRATE SYSTEM BY HIGH-INTENSITY PULSED ELECTRON BEAM. REPORT 2</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Иванов</surname><given-names>Ю. Ф.</given-names></name><name name-style="western" xml:lang="en"><surname>Ivanov</surname><given-names>Yu. F.</given-names></name></name-alternatives><bio xml:lang="ru"><p>д.ф.-м. н., ведущий научный сотрудник, профессор</p></bio><bio xml:lang="en"><p>Dr. Sci. (Phys.–Math.), Leading Researcher,Professor</p></bio><email xlink:type="simple">yufi55@mail.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Денисова</surname><given-names>Ю. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Denisova</surname><given-names>Yu. A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>к.ф.-м. н., младший научный сотрудник, научный сотрудник лаборатории низкотемпературной плазмы</p></bio><bio xml:lang="en"><p>Cand. Sci. (Phys.-math.), Research Associate of the Laboratory of Low-temperature Plasma</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Тересов</surname><given-names>А. Д.</given-names></name><name name-style="western" xml:lang="en"><surname>Teresov</surname><given-names>A. D.</given-names></name></name-alternatives><bio xml:lang="ru"><p>ведущий электроник, младший научный сотрудник лаборатории низкотемпературной плазмы</p></bio><bio xml:lang="en"><p>Leading Electronic Engineer of the Laboratory of Low-temperature Plasma</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Крысина</surname><given-names>О. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Krysina</surname><given-names>O. V.</given-names></name></name-alternatives><bio xml:lang="ru"><p>младший научный сотрудник, младший научный сотрудник лаборатории низкотемпературной плазмы</p></bio><bio xml:lang="en"><p>Junior Researcher of the Laboratory of Low-temperature Plasma</p></bio><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Институт сильноточной электроники СО РАН (634055, Россия, г. Томск, пр. Академический, 2/3)&#13;
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Национальный исследовательский Томский государственный университет (634050, Россия, г. Томск, пр. Ленина, 36)</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Institute of High Current Electronics of SB RAS (2/3, Akademicheskii ave., Tomsk, 634055, Russia)&#13;
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National Research Tomsk State University (36, Lenina ave., Tomsk, 634050, Russia)</institution><country>Russian Federation</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2015</year></pub-date><pub-date pub-type="epub"><day>28</day><month>11</month><year>2015</year></pub-date><volume>58</volume><issue>10</issue><fpage>775</fpage><lpage>780</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Иванов Ю.Ф., Денисова Ю.А., Тересов А.Д., Крысина О.В., 2015</copyright-statement><copyright-year>2015</copyright-year><copyright-holder xml:lang="ru">Иванов Ю.Ф., Денисова Ю.А., Тересов А.Д., Крысина О.В.</copyright-holder><copyright-holder xml:lang="en">Ivanov Y.F., Denisova Y.A., Teresov A.D., Krysina O.V.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://fermet.misis.ru/jour/article/view/747">https://fermet.misis.ru/jour/article/view/747</self-uri><abstract><p>Рассмотрены результаты анализа элементного и фазового составов, дефектной субструктуры поверхностного слоя стали 40Х, подвергнутой легированию путем облучения системы пленка (алюминий или титан) – подложка (сталь 40Х) высокоинтенсивным импульсным электронным пучком. Показано, что облучение системы пленка (титан) – подложка (сталь 40Х) импульсным электронным пучком сопровождается легированием стали на глубину расплавленного слоя (толщиной приблизительно 15 мкм); образованию поликристаллической (с субмикронным размером зерен) структуры на основе α-фазы, упрочненной наноразмерными частицами карбида титана. Облучение системы пленка (алюминий) – подложка (сталь 40Х) импульсным электронным пучком приводит к легированию тонкого (толщиной приблизительно 2 мкм) поверхностного слоя стали, что обусловлено испарением алюминия с поверхности стали; формированию мартенситной структуры, упрочненной наноразмерными алюминидами железа.</p></abstract><trans-abstract xml:lang="en"><p>The paper presents the results of the analysis of the elementaland phase composition, defect substructure of the 40Cr steel surfacelayer, subjected to alloying by irradiation of fi lm (aluminum or titanium) – substrate (40Cr steel) system by high-intensity pulsed electron beam. It is shown that irradiation of fi lm (titanium) – substrate (40Cr steel) system by pulse electron beam is accompanied by steel alloying to a depth of the molten layer (with the thickness of approximately 15 μm); the formation of polycrystalline (with submicron grain size) of the structure on the basis of α-phase, hardened with nanosized particles of titanium carbide. The irradiation of fi lm (aluminum) – substrate (40Cr steel) system with pulse electron beam leads to the alloying of thin (approximately 2 μm) of the steel surface layer, due to the evaporation of the aluminum from the steel surface; the formation of a martensite structure, hardened by nanosized iron alu-minides.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>сталь 40Х</kwd><kwd>система пленка – подложка</kwd><kwd>структура</kwd><kwd>высокоинтенсивный импульсный электронный пучок</kwd></kwd-group><kwd-group xml:lang="en"><kwd>40Cr steel</kwd><kwd>the film/substrate system</kwd><kwd>structure</kwd><kwd>high-intensity pulsed electron beam</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Ivanov Yu.F., Denisova Yu.A., Teresov A.D., Krysina O.V. Formation of surface alloys at melting of fi lm/substrate system by high-intensity pulsed electron beam. Report 1. 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